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N Type ,InAs(Indium Arsenide ) Wafer , 2”, Mechanical Grade

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N Type ,InAs(Indium Arsenide ) Wafer , 2”, Mechanical Grade

Brand Name : PAM-XIAMEN

Place of Origin : China

MOQ : 1-10,000pcs

Payment Terms : T/T

Supply Ability : 10,000 wafers/month

Delivery Time : 5-50 working days

Packaging Details : Packaged in a class 100 clean room environment, in single container, under a nitrogen atmosphere

product name : Mechanical Grade Indium arsenide Wafer

Wafer Diamter : 2 inch

Conduction Type : N Type

Grade : Mechanical Grade

usage : infrared detectors

keyword : single crystal InAs wafer

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N Type ,InAs(Indium Arsenide ) Wafer , 2”, Mechanical Grade
PAM-XIAMEN provides single crystal InAs(Indium arsenide) wafer for infrared detectors, photovoltaic photodiodes detectors, diode lasers in lower noise or higher-power applications at room temperature. in diameter up to 4 inch. Indium Arsenide ( InAs ) crystal is formed by two elements , Indium and Arsenide , growth by Liquid Encapsulated Czochralski ( LEC ) method or VGF method . InAs wafer is is similar to gallium arsenide and is a direct bandgap material.
Indium arsenide is sometimes used together with indium phosphide. Alloyed with gallium arsenide it forms indium gallium arsenide - a material with band gap dependent on In/Ga ratio, a method principally similar to alloying indium nitride with gallium nitride to yield indium gallium nitride. PAM-XIAMEN can provide epi ready grade InAs wafer for your MOCVD & MBE epitaxial application .Please contact our engineer team for more wafer information.

2" InAs Wafer Specification

ItemSpecifications
DopantStannumSulphur
Conduction TypeN-typeN-type
Wafer Diameter2"
Wafer Orientation(100)±0.5°
Wafer Thickness500±25um
Primary Flat Length16±2mm
Secondary Flat Length8±1mm
Carrier Concentration(5-20)x1017cm-3(1-10)x1017cm-3
Mobility7000-20000cm2/V.s6000-20000cm2/V.s
EPD <5x104cm-2<3x104cm-2
TTV<10um
BOW<10um
WARP<12um
Laser markingupon request
Suface finishP/E, P/P
Epi readyyes
PackageSingle wafer container or cassette

What is a InAs test Wafer?

Most test wafers are wafers which have fallen out of prime specifications. Test wafers may be used to run marathons, test equipment and for high-end R & D. They are often a cost-effective alternative to prime wafers.

Band structure and carrier concentration of InAs Wafer

Basic Parameters

Energy gap0.354 eV
Energy separation (EΓL) between Γ and L valleys0.73 eV
Energy separation (EΓX) between Γ and X valleys1.02 eV
Energy spin-orbital splitting0.41 eV
Intrinsic carrier concentration1·1015 cm-3
Intrinsic resistivity0.16 Ω·cm
Effective conduction band density of states8.7·1016 cm-3
Effective valence band density of states6.6·1018 cm-3

N Type ,InAs(Indium Arsenide ) Wafer , 2”, Mechanical GradeBand structure and carrier concentration of InAs.
Important minima of the conduction band and maxima of the valence band.
Eg= 0.35 eV
EL= 1.08 eV
EX= 1.37 eV
Eso = 0.41 eV

Temperature Dependences

Temperature dependence of the direct energy gap

Eg = 0.415 - 2.76·10-4·T2/(T+83) (eV),

where T is temperature in degrees K (0 <T < 300).

Effective density of states in the conduction band

Nc≈1.68·1013·T3/2 (cm-3).

Effective density of states in the valence band

Nv≈ 1.27·1015·T3/2(cm-3).

N Type ,InAs(Indium Arsenide ) Wafer , 2”, Mechanical GradeThe temperature dependences of the intrinsic carrier concentration.
N Type ,InAs(Indium Arsenide ) Wafer , 2”, Mechanical GradeFermi level versus temperature for different concentrations of shallow donors and acceptors.

Dependences on Hydrostatic Pressure

Eg≈Eg(0) + 4.8·10-3P (eV)
EL≈ EL(0) + 3.2·10-3P (eV)

where P is pressure in kbar

Energy Gap Narrowing at High Doping Levels

N Type ,InAs(Indium Arsenide ) Wafer , 2”, Mechanical GradeEnergy gap narrowing versus donor (Curve 1) and acceptor (Curve 2 ) doping density.
Curves are calculated according
Points show experimental results for n-InAs

For n-type InAs

ΔEg = 14.0·10-9·Nd1/3 + 1.97·10-7·Nd1/4 + 57.9·10-12·Nd1/2 (eV)

For p-type InAs

ΔEg = 8.34·10-9·Na1/3 + 2.91·10-7·Na1/4 + 4.53·10-12·Na1/2 (eV)

Effective Masses

Electrons:

N Type ,InAs(Indium Arsenide ) Wafer , 2”, Mechanical GradeElectron effective mass versus electron concentration

For Γ-valleymΓ = 0.023mo
Nonparabolicity:
E(1+αE) = h2k2/(2mΓ)
α = 1.4 (eV-1)
In the L-valley effective mass of density of statesmL=0.29mo
In the X-valley effective mass of density of statesmX=0.64mo

Holes:

Heavymh = 0.41mo
Lightmlp = 0.026mo
Split-off bandmso = 0.16mo

Effective mass of density of states mv = 0.41mo

Donors and Acceptors

Ionization energies of shallow donors

≥ 0.001(eV): Se, S, Te, Ge, Si, Sn, Cu

Ionization energies of shallow acceptors, eV

SnGeSiCdZn
0.010.0140.020.0150.01


Are You Looking for an InAs substrate?
PAM-XIAMEN is proud to offer indium phosphide substrate for all different kinds of projects. If you are looking for InAs wafers, send us enquiry today to learn more about how we can work with you to get you the InAs wafers you need for your next project. Our group team is looking forward to providing both quality products and excellent service for you!



















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